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David B. Graves

David B. Graves

· Professor of Chemical and Biological Engineering

Princeton University · Chemical and Biological Engineering

Active 1967–2026

h-index74
Citations22.2k
Papers41046 last 5y
Funding$315k

Academic metrics are sourced from OpenAlex and public funding records; values may differ from Google Scholar.

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About

David B. Graves is a Professor of Chemical and Biological Engineering at Princeton University. His research centers around the science and applications of non-equilibrium, or 'low temperature,' ionized gas plasma. He investigates the properties of non-equilibrium plasma (NEP), a weakly to partially ionized gas where electrons are generally much hotter than neutral or ionic species, enabling a wide range of technological applications. His work includes plasma applications in semiconductor and quantum device nanofabrication, where plasma is used in nearly half of the steps involved in manufacturing semiconductor integrated circuits, primarily through thin film etching or deposition. He focuses on developing advanced plasma models, large-scale computing, plasma and surface diagnostics, machine learning, and process control to address challenges such as controlling device critical dimensions at nanometer scales and minimizing contamination and damage, especially in quantum device fabrication. Additionally, Graves explores plasma's biomedical applications, including disinfection, wound healing, cancer treatment, and dental procedures, leveraging plasma-generated reactive species and their interactions with biological tissues. His research also extends to chemical processing, where plasma is used to induce chemical transformations and promote electrification of industrial processes, with an emphasis on improving chemical selectivity through coupling plasma with catalysis. Graves…

Research topics

  • Sociology
  • Materials science
  • Physics
  • Artificial Intelligence
  • Computer Science
  • Engineering
  • Nanotechnology
  • Machine Learning
  • Biochemical engineering
  • Nuclear physics

Selected publications

  • The 2022 Plasma Roadmap: low temperature plasma science and technology

    Journal of Physics D Applied Physics · 2022 · 497 citations

    Abstract The 2022 Roadmap is the next update in the series of Plasma Roadmaps published by Journal of Physics D with the intent to identify important outstanding challenges in the field of low-temperature plasma (LTP) physics and technology. The format of the Roadmap is the same as the previous Roadmaps representing the visions of 41 leading experts representing 21 countries and five continents in the various sub-fields of LTP science and technology. In recognition of the evolution in the field,…

  • Nitrogen fixation as NO<sub><i>x</i></sub> using air plasma coupled with heterogeneous catalysis at atmospheric pressure

    Plasma Processes and Polymers · 2023-11-02 · 30 citations

    articleOpen accessSenior authorCorresponding

    Abstract This study presents insights into the use of activated catalysts to improve the energy efficiency of production in atmospheric pressure air plasma. The introduction of catalysts in the direct current glow discharge system reduces the energy cost of production by up to 45% at low gas flow rates. Notably, even when positioned away from the plasma zone, the catalyst enhanced production, suggesting a significant role for the catalytic activation of downstream neutral species. The study also…

  • Science challenges and research opportunities for plasma applications in microelectronics

    Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2024-06-03 · 26 citations

    articleOpen access1st authorCorresponding

    Low-temperature plasmas (LTPs) are essential to manufacturing devices in the semiconductor industry, from creating extreme ultraviolet photons used in the most advanced lithography to thin film etching, deposition, and surface modifications. It is estimated that 40%–45% of all process steps needed to manufacture semiconductor devices use LTPs in one form or another. LTPs have been an enabling technology in the multidecade progression of the shrinking of device dimensions, often referred to as Mo…

  • Compact and accurate chemical mechanism for methane pyrolysis with PAH growth

    International Journal of Hydrogen Energy · 2024-01-04 · 24 citations

    articleOpen accessSenior author
  • Enhancing nitrogen fixation efficiency in glow-like discharge by reducing cathode-fall voltage

    Plasma Sources Science and Technology · 2024-10-01 · 16 citations

    articleOpen accessSenior author

    Abstract In plasma nitrogen fixation devices, discharge electrodes are crucial yet susceptible to oxidation and corrosion due to plasma’s high temperatures and oxygen content, which could alter discharge modes. This research evaluates the impact of different electrode materials, including iron, chromium, nickel, copper, and 304 stainless steel, on nitrogen fixation efficiency in glow-like discharges driven by high-voltage DC power. Notably, iron and 304 stainless steel cathodes undergo a mode tr…

Recent grants

Frequent coauthors

  • Robert D. Short

    University of Sheffield

    86 shared
  • Nishtha Gaur

    Lancaster University

    84 shared
  • Akimitsu Hatta

    Photonic Systems (United States)

    84 shared
  • Sung‐Ha Hong

    University of South Australia

    84 shared
  • Endre J. Szili

    University of South Australia

    84 shared
  • Allison J. Cowin

    University of South Australia

    83 shared
  • Christine Charles

    Australian National University

    83 shared
  • Masafumi Ito

    Japanese Red Cross Nagoya Daiichi Hospital

    83 shared

Labs

Education

  • PhD, Chemical Engineering

    University of Minnesota

    1986
  • Masters of Science, Chemical Engineering

    University of Arizona

    1981
  • Bachelor of Science, Chemical Engineering

    University of Arizona

    1978

Awards & honors

  • Plasma Chemistry Award, International Plasma Chemistry Socie…
  • ISPlasma Prize, 2024
  • Fellow of the International Plasma Chemistry Society, 2023
  • Plasma Material Science Hall of Fame Prize, 2022
  • Huazhong University of Science and Technology, Foreign Exper…

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